## [Thin film science and technology](/research/thin-film-science-technology)
# Thin film science and technology
Advancing thin film materials through integrated physical vapor deposition, plasma diagnostics, and advanced characterization
Our multidisciplinary team develops and applies cutting edge thin film deposition technologies, with an emphasis on physical vapor deposition (PVD) of ultrathick coatings on non-planar substrates. We combine bespoke engineering of deposition systems with expertise in plasma diagnostics and advanced materials characterization to better understand and, ultimately, control the microstructure and residual stress in coatings.
## Research thrust areas
- Physical vapor deposition
- Plasma diagnostics
- Advanced characterization
A custom coating system. ### Physical vapor deposition
We develop and optimize PVD processes for complex materials, intricate substrate geometries, and demanding performance environments. Current research includes:
- Designing and implementing custom coating systems
- Developing novel magnetron sputtering and evaporation processes
- Fabricating hollow spherical shells from low-atomic-mass materials, including beryllium, boron carbide, and diamond-like carbon
- Investigating ultrathick film deposition by energetic condensation
In-situ plasma diagnostics system. ### Plasma diagnostics
A central focus of our work is the in-depth characterization of plasmas and their interaction with growing films. We employ in situ plasma diagnostics to:
- Measure temporally-resolved energy distributions of the ions and neutrals bombarding the film surface during growth
- Relate plasma parameters to the film’s microstructure, stress, and defect formation
- Support the design of bespoke deposition sources for improved process control
- Develop models that connect plasma discharge conditions to coating properties
These efforts enable predictive control of PVD processes and accelerate the development of deposition recipes for new material systems and substrate configurations.
Advanced quantitative analysis of spherical shells by x-ray tomography. ### Advanced characterization
To better understand and control thin film performance, we couple advanced deposition and plasma diagnostics with a broad suite of both in-situ and ex-situ material characterization techniques. Research in this area includes:
- Correlating high-energy ion beam analysis, x-ray methods, and microscopy with process conditions
- Using x-ray computed tomography for the 3D metrology of coatings on non-planar substrates such as spheres and sphero-cylinders.
- Applying spectroscopy and surface analytical tools to probe bonding, defects, and interfaces
- Combining both in-situ and ex-situ stress measurements with microstructural analysis to better understand film growth processes
## Researchers
[](https://people.llnl.gov/kucheyev1) [Sergei Kucheyev](https://people.llnl.gov/kucheyev1)
Deputy Group Leader, Nanoscale Integration Science
[](https://people.llnl.gov/bayuaji1) [Leonardus Bimo Bayu Aji](https://people.llnl.gov/bayuaji1)
Staff Scientist
[](https://people.llnl.gov/engwall1) [Alison Engwall](https://people.llnl.gov/engwall1)
Staff Scientist
[](https://people.llnl.gov/forien1) [Jean-Baptiste Forien](https://people.llnl.gov/forien1)
Staff Scientist
[](https://people.llnl.gov/shin5) [Swanee Shin](https://people.llnl.gov/shin5)
Staff Scientist
 Gregory Taylor
## Publications
### 2026
[Sputter deposition of ultrathick Bi coatings onto rotating substrates for inertial confinement fusion](https://doi.org/10.1016/j.vacuum.2025.114860)
*Vacuum*, 2026
D.C. Goodelman, A.M. Engwall-Holmes, G.V. Taylor, E. Kim, J.B. Merlo, N. Vishnoi, S.J. Shin, R.J. Vargas, S.O. Kucheyev, and L.B. Bayu Aji
### 2025
[Effects of hydrogen on sputter deposited boron carbide films](https://doi.org/10.1063/5.0272124)
*Journal of Applied Physics*, 2025
M.S. Wong, G.V. Taylor, M. Seo, L.R. Sohngen, J.B. Merlo, L.B. Bayu Aji, S.J. Shin, S. Nakamura, and S.O. Kucheyev
[Effects of substrate bias and tilt on magnetron sputtered boron carbide films](https://doi.org/10.1016/j.diamond.2025.112992)
*Diamond and Related Materials*, 2025
S. Graiser, G.V. Taylor, L.B. Bayu Aji, S.J. Shin, D.C. Goodelman, L.R. Sohngen, J.B. Merlo, X. Lepro Chavez, and S.O. Kucheyev
[High Power Impulse Magnetron Sputter Deposition of boron carbide with full face erosion magnetron and mixed Ar Ne plasma](https://doi.org/10.1080/15361055.2025.2560729)
*Fusion Science and Technology*, 2025
G.V. Taylor, S. Graiser, L.B. Bayu Aji, S.J. Shin, D.C. Goodelman, X. Lepro, and S.O. Kucheyev
[High Power Impulse Magnetron Sputter Deposition of ultrathick amorphous carbon](https://doi.org/10.1080/15361055.2025.2502890)
*Fusion Science and Technology*, 2025
A.M. Engwall-Holmes, L.B. Bayu Aji, S.J. Shin, J.B. Merlo, J.H. Bae, and S.O. Kucheyev
[High-rate magnetron sputter deposition of low stress boron carbide films on tilted substrates](https://doi.org/10.1063/5.0283657)
*Journal of Applied Physics*, 2025
K. Kawasaki, J.B. Merlo, S. Gonzalez, L.B. Bayu Aji, S.J. Shin, G.V. Taylor, A.M. Engwall-Holmes, M. Seo, A.A. Baker, M.S. Wong, F.M. O’Neill, and S.O. Kucheyev
[Magnetized, radiofrequency driven hollow cathode chemical vapor deposition of ultrathick hydrogenated amorphous carbon](https://doi.org/10.1116/6.0004905)
*Journal of Vacuum Science & Technology B*, 2025
J.S. Miller, L.B. Bayu Aji, S.O. Kucheyev, and S. Falabella
[Plasma focused ion beam milling of high aspect ratio holes in diamond](https://doi.org/10.1080/15361055.2025.2498198)
Fusion Science and Technology, 2025
S.J. Shin, J.B. Forien, D.C. Goodelman, L.B. Bayu Aji, E. Kim, and S.O. Kucheyev
### Prior
[Development of new magnetron sputter deposition processes for laser target fabrication](https://doi.org/10.1080/15361055.2023.2184667)
*Fusion Science and Technology*, 2023
S.O. Kucheyev, S.J. Shin, L.B. Bayu Aji, J.H. Bae, A.M. Engwall, and G.V. Taylor